Task-technology Fit Theory: An Approach for Mitigating Technostress

Nelda Vendramin*, Giulia Nardelli, Christine Ipsen

*Corresponding author for this work

Research output: Chapter in Book/Report/Conference proceedingBook chapterResearchpeer-review

328 Downloads (Pure)

Abstract

This chapter presents the task-technology fit theory, which argues that the functionality of technology and the task it aims to support should match with the individual abilities of users to achieve improved performance and outcomes. Furthermore, we look at the transactional theory of stress and coping, which explains how stress emerges between the interaction of individuals and their environment and how individuals cope with stress. With these theories, we explore technostress as a workplace issue in knowledge work. Technostress refers to the challenges of adopting and coping with new digital technologies and affects knowledge workers’ well-being at work. In this chapter, we combine the task-technology fit theory with the transactional theory of stress and coping in a conceptual framework that workplace researchers can use to investigate the implementation of new digital technologies and their maintenance in workplaces while minimising technostress. We propose to apply and test the conceptual framework through action research by applying methods that can reduce the negative effects of technostress, for example building awareness of technostress, minimising techno-stressors, and establishing adaptive coping mechanisms. While contributing to work-related stress research, participatory interventions may also assist organizations in reducing the effects of technostress.
Original languageEnglish
Title of host publicationA Handbook of Theories on Designing Alignment between People and the Office Environment
EditorsRianne Appel-Meulenbroek, Vitalija Danivska
Number of pages15
Place of PublicationAbingdon
PublisherRoutledge
Publication date2021
Pages39-53
Chapter4
ISBN (Print)9780367652999, 9780367653088
ISBN (Electronic)9781003128830, 9781000416510
DOIs
Publication statusPublished - 2021
Externally publishedYes

Cite this