| Original language | English |
|---|---|
| Journal | International Journal of Technology Management |
| Volume | 20 |
| Issue number | 5/6/7/8 |
| Pages (from-to) | 657-669 |
| ISSN | 0267-5730 |
| Publication status | Published - 2000 |
Cite this
Kreiner, K., & Lee, K. (2000). Competence and community: Post-acquisition learning processes in high-tech companies. International Journal of Technology Management, 20(5/6/7/8), 657-669.
@article{31ed42f0c02411db9769000ea68e967b,
title = "Competence and community: Post-acquisition learning processes in high-tech companies",
keywords = "Organisatorisk l{\ae}ring, Kompetence, Innovation, H{\o}jteknologiske virksomheder",
author = "Kristian Kreiner and Kristina Lee",
note = "Opstilling: Int",
year = "2000",
language = "English",
volume = "20",
pages = "657--669",
journal = "International Journal of Technology Management",
issn = "0267-5730",
publisher = "Inderscience Publishers",
number = "5/6/7/8",
}
Kreiner, K & Lee, K 2000, 'Competence and community: Post-acquisition learning processes in high-tech companies', International Journal of Technology Management, vol. 20, no. 5/6/7/8, pp. 657-669.
Competence and community : Post-acquisition learning processes in high-tech companies. / Kreiner, Kristian; Lee, Kristina.
In: International Journal of Technology Management, Vol. 20, No. 5/6/7/8, 2000, p. 657-669.Research output: Contribution to journal › Journal article › Research › peer-review
TY - JOUR
T1 - Competence and community
T2 - Post-acquisition learning processes in high-tech companies
AU - Kreiner, Kristian
AU - Lee, Kristina
N1 - Opstilling: Int
PY - 2000
Y1 - 2000
KW - Organisatorisk læring
KW - Kompetence
KW - Innovation
KW - Højteknologiske virksomheder
M3 - Journal article
VL - 20
SP - 657
EP - 669
JO - International Journal of Technology Management
JF - International Journal of Technology Management
SN - 0267-5730
IS - 5/6/7/8
ER -
Kreiner K, Lee K. Competence and community: Post-acquisition learning processes in high-tech companies. International Journal of Technology Management. 2000;20(5/6/7/8):657-669.